CONTROLLED MAGNETIC-ANISOTROPY IN AS-OBTAINED ELECTROLYTIC CYLINDRICAL COP AMORPHOUS MULTILAYERS

Citation
C. Favieres et al., CONTROLLED MAGNETIC-ANISOTROPY IN AS-OBTAINED ELECTROLYTIC CYLINDRICAL COP AMORPHOUS MULTILAYERS, Journal of magnetism and magnetic materials, 177, 1998, pp. 107-108
Citations number
4
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
03048853
Volume
177
Year of publication
1998
Part
1
Pages
107 - 108
Database
ISI
SICI code
0304-8853(1998)177:<107:CMIAEC>2.0.ZU;2-C
Abstract
CoP electrolytic monolayers and multilayers were grown over copper wir es using a constant or pulsed electrical current density, exhibiting r adial or planar anisotropy, respectively. Over the surface of a monola yer, multilayers of different thicknesses were deposited. The surface radial anisotropy evolves to a planar one as the overlayer thicknesses increase. The surface magnetization is coupled with the bulk anisotro py for overlayer thickness up to approximate to 2 mu m. (C) 1998 Elsev ier Science B.V. All rights reserved.