CONTROLLED ANISOTROPIC GMR IN LASER-ABLATED CU-CO THIN-FILMS

Citation
V. Madurga et al., CONTROLLED ANISOTROPIC GMR IN LASER-ABLATED CU-CO THIN-FILMS, Journal of magnetism and magnetic materials, 177, 1998, pp. 945-946
Citations number
4
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
03048853
Volume
177
Year of publication
1998
Part
2
Pages
945 - 946
Database
ISI
SICI code
0304-8853(1998)177:<945:CAGILC>2.0.ZU;2-1
Abstract
Controlled microstructured Cu-Co thin films have been fabricated by pu lsed-laser ablation during which the target was rotated between 10 and 32 rpm. The samples exhibit giant magnetoresistance after the films a re annealed. The films obtained at low rotation velocities require a h igher magnetic field (approximate to 0.15 T) to achieve the maximum re sistance in the perpendicular MR as compared to 0.05 T for the paralle l MR. On the other hand, the films obtained at higher rotation velocit ies require quantitatively similar magnetic fields in both orientation s, about 0.05 T. This effect is discussed in terms of shape and crysta lline anisotropy of magnetic nanoparticles. (C) 1998 Elsevier Science B.V. All rights reserved.