M. Metikoshukovic et al., CORROSION PROTECTION OF ALUMINUM IN ACIDIC CHLORIDE SOLUTIONS WITH NONTOXIC INHIBITORS, Journal of Applied Electrochemistry, 28(4), 1998, pp. 433-439
Corrosion kinetics of 99.6% aluminium covered by a thin spontaneously
formed oxide film in hydrochloric acid solution with and without the p
resence of substituted N-aryl pyrroles was studied using electrochemic
al impedance spectroscopy and quasi steady-state polarization. Measure
ments were performed on a rotating disc electrode in an argon-deaerate
d solution in the temperature range 20 to 50 degrees C. The addition o
f inhibitor considerably increases overvoltage of the cathodic process
(HER) and shifts E-corr to negative potential values. The activation
energy of the hydrogen evolution reaction was E-a = 50 +/- 5 kJ mol(-1
) and was not affected by the presence of inhibitor. The inhibitory ac
tion occurs by pi-bonding between the adsorbed inhibitor molecules and
the electrode surface. The electrode coverage follows the Langmuir ad
sorption isotherm with an adsorption equilibrium constant K = 1.1-2.64
x 10(5) dm(3) mol(-1). The adsorption of organic compound prevents th
e adsorption of chloride ions and slow down the rate of corrosion.