Jh. Yang et al., PHOTOSENSITIZATION EFFECTS OF PORPHYRIN ON N-SI(111) AND N-GAAS(100), Journal of photochemistry and photobiology. A, Chemistry, 112(2-3), 1998, pp. 225-229
Photosensitization effects of 5,10,15,20-tetrakis-(4-trimethylaminephe
nyl) porphyrin tetraiodide(TAPPI) on n-Si(111) and n-GaAs(100) were st
udied by surface photovoltage spectroscopy. n-Si can be sensitized onl
y in the Soret band absorption region of the TAPPI molecule, n-GaAs ca
n be sensitized in the whole irradiation region (h nu > E-g). The diag
rams of energetic level correlation between the TAPPI molecule and the
two semiconductor substrates were determined by cyclic voltammetric m
easurement and, on the basis of them, the different photosensitization
effects of TAPPI on n-Si and n-GaAs are explained reasonably. (C) 199
8 Elsevier Science S.A.