Jf. Banfield et T. Murakami, ATOMIC-RESOLUTION TRANSMISSION ELECTRON-MICROSCOPE EVIDENCE FOR THE MECHANISM BY WHICH CHLORITE WEATHERS TO 1 1-SEMI-REGULAR CHLORITE-VERMICULITE/, The American mineralogist, 83(3-4), 1998, pp. 348-357
Atomic-resolution transmission electron microscope (TEM) images reveal
that IIbb (beta = 97 degrees) Mg,Al,Fe-chlorite from Koongarra, Austr
alia, transforms to vermiculite via a range of intermediate chemical a
nd structural states. Semi-quantitative analysis of contrast in atomic
-resolution images of layer silicates with similar to 1.4 nm basal spa
cings indicate that the interlayers range from brucite-like to having
similar to 0.3-0.6 interlayer cations per formula unit. Octahedral cat
ions (predominantly Mg and Fe) tend to be removed from every second in
terlayer, leading to semi-regular 1:1 interstratifications of chlorite
-vermiculite. Further loss of interlayer cations is accompanied by par
tial to complete interlayer collapse in the vacuum of the TEM. Resulti
ng intergrowths of chlorite and semi-regular 1:1 chlorite-vermiculite
retain the primary chlorite orientation, morphology, and sense of octa
hedral tilt in 2:1 layers. Although vermiculitization is a continuous
process that occurs by a solid-state mechanism, the reaction involves
important structural modifications. Atomic-resolution [010] images ind
icate initial loss of interlayer cations is accompanied by similar to
a/3 shifts of 2:1 layers and cations in brucite-like interlayers. Disp
lacements of interlayer cations change the interlayer stacking from Il
bb to Iab and shift of the following 2:1 layer converts it from Iab to
the Iaa. Displacements are driven by the lower energy of a-type inter
actions when vacancies occur in sites above tetrahedral cations. Shift
of a 2:1 layer alters the subsequent interlayer from Ilbb to IIab. St
abilization of every slightly altered second interlayer by introductio
n of a-type stacking explains development of semi-regular 1:1 chlorite
-vermiculite interstratifications. Displacements occur before signific
ant modification of interlayer electron density can be detected in hig
h-resolution images. This observation is consistent with previously re
ported inhibition of layer shifts by low interlayer charge. Layer disp
lacement may occur by an elastic process (no rupture of bonds within t
he 2:1 layer) at the tip of the growing vermiculite portion of the int
ergrowth. Removal of cations from the chlorite-vermiculite junction ma
y be facilitated by rapid diffusion along the vacancy-rich interlayer.
Mg is removed in solution, Fe is precipitated locally in aggregates o
f nanocrystalline Al-, Si-, and P-bearing goethite.