Different methods can be adopted for the fabrication of ferromagnetic
structures in micron-scale regime. We have developed photolysis of org
anometallic compounds for the fabrication of magnetic multilayers, in
order to deposit micron-scale magnetic patterns on semiconductor subst
rates. Large arrays of identical micron-scale Ni features were deposit
ed using this method. The magnetic properties were studied by alternat
ing gradient force magnetometry as well as magnetic force microscopy.
The measurements show that the structures are spatially well defined,
and the magnetic properties are related to the structural shapes of th
e features. This deposition method demonstrates a new approach for nov
el device fabrication.