M. Yeadon et al., IN-SITU TRANSMISSION ELECTRON-MICROSCOPY OF ALN GROWTH BY NITRIDATIONOF (0001)ALPHA-AL2O3, Journal of applied physics, 83(5), 1998, pp. 2847-2850
Using a novel ultrahigh vacuum transmission electron microscope (TEM)
with in situ reactive molecular beam epitaxy system, we report the suc
cessful synthesis of epitaxial AlN on the (0001) sapphire surface upon
exposure to ammonia. The substrate, an electron transparent sapphire
foil, was annealed in oxygen at high temperature to eliminate damage i
nduced during preparation and to create large atomically flat regions.
The sample was then held at 950 degrees C in flowing ammonia inside t
he microscope for 2 h during which periodic observations of microstruc
tural development were made. We report direct observation of the forma
tion of epitaxial AlN with the orientation relationship (0001)(AlN)//(
0001)(sub), [(1) over bar 010](AlN)//[1120](sub) and present both TEM
and atomic force microscope images of the sample before and after nitr
idation. The results are consistent with a diffusion-limited reaction
model involving transport of oxygen and nitrogen ions through the grow
ing AlN epilayer between the free surface and the unreacted alpha-Al2O
3. (C) 1998 American Institute of Physics.