Al. Molinero et al., SILICON DETERMINATION BY INDUCTIVELY-COUPLED PLASMA-ATOMIC EMISSION-SPECTROMETRY AFTER GENERATION OF VOLATILE SILICON TETRAFLUORIDE, Talanta, 45(6), 1998, pp. 1211-1217
A method for the determination of silicon by inductively coupled plasm
a atomic emission spectrometry (ICP-AES) is described. The procedure i
s based on a discontinuous generation of volatile silicon tetrafluorid
e in concentrated sulphuric acid medium after injecting 125 mu l of 0.
1%, w/v sodium fluoride solution into 100 mu l of the sample. The gase
ous silicon tetrafluoride is fed directly into the ICP torch by a flow
of 250 ml min(-1) Ar carrier gas. The calibration curve was linear up
to al least 100 mu g ml(-1) of Si(IV) and the absolute detection limi
t was 9.8 ng working with a solution volume of 100 mu l. The relative
standard deviation for six measurements of 10 mu g ml(-1) of Si(IV) wa
s 2.32%. The method was applied to the determination of silicon in wat
er and iron ores. (C) 1998 Elsevier Science B.V.