LOW-TEMPERATURE THERMOMETER USING SPUTTERED ZRNX THIN-FILM
Citation
T. Yotsuya et al., LOW-TEMPERATURE THERMOMETER USING SPUTTERED ZRNX THIN-FILM, Cryogenics, 37(12), 1997, pp. 817-822
Categorie Soggetti
Physics, Applied",Thermodynamics
SICI code
0011-2275(1997)37:12<817:LTUSZT>2.0.ZU;2-1
Abstract
A thin film thermometer using sputtered zirconium nitride has been inv
estigated as a low-temperature thermometer. This film deposited on a s
apphire substrate can be used to measure a wide temperature range from
1 to 300 K with reasonable sensitivity within a fast response time. T
he thermometer sensitivity can be altered by changing fabrication cond
itions. Moreover, the thermometer is almost insensitive to magnetic fi
elds. The temperature error in a magnetic field of 6T is less than 10
mK at 4.2 K. (C) 1998 Elsevier Science Ltd. All rights reserved.