LOW-TEMPERATURE THERMOMETER USING SPUTTERED ZRNX THIN-FILM

Citation
T. Yotsuya et al., LOW-TEMPERATURE THERMOMETER USING SPUTTERED ZRNX THIN-FILM, Cryogenics, 37(12), 1997, pp. 817-822
Citations number
13
Categorie Soggetti
Physics, Applied",Thermodynamics
Journal title
ISSN journal
00112275
Volume
37
Issue
12
Year of publication
1997
Pages
817 - 822
Database
ISI
SICI code
0011-2275(1997)37:12<817:LTUSZT>2.0.ZU;2-1
Abstract
A thin film thermometer using sputtered zirconium nitride has been inv estigated as a low-temperature thermometer. This film deposited on a s apphire substrate can be used to measure a wide temperature range from 1 to 300 K with reasonable sensitivity within a fast response time. T he thermometer sensitivity can be altered by changing fabrication cond itions. Moreover, the thermometer is almost insensitive to magnetic fi elds. The temperature error in a magnetic field of 6T is less than 10 mK at 4.2 K. (C) 1998 Elsevier Science Ltd. All rights reserved.