SPECIAL ISSUE - THIN-FILM PROCESSING BY CHEMICAL-VAPOR-DEPOSITION - PREFACE

Authors
Citation
Rm. Laine, SPECIAL ISSUE - THIN-FILM PROCESSING BY CHEMICAL-VAPOR-DEPOSITION - PREFACE, Applied organometallic chemistry, 12(3), 1998, pp. 3-3
Citations number
NO
Categorie Soggetti
Chemistry Applied","Chemistry Inorganic & Nuclear
ISSN journal
02682605
Volume
12
Issue
3
Year of publication
1998
Pages
3 - 3
Database
ISI
SICI code
0268-2605(1998)12:3<3:SI-TPB>2.0.ZU;2-A