HALOGEN ADSORPTION ON TRANSITION-METAL SURFACES - A CASE-STUDY OF CL ON TA(110)

Authors
Citation
Cj. Wu et Je. Klepeis, HALOGEN ADSORPTION ON TRANSITION-METAL SURFACES - A CASE-STUDY OF CL ON TA(110), Physical review. B, Condensed matter, 55(16), 1997, pp. 10848-10853
Citations number
22
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
01631829
Volume
55
Issue
16
Year of publication
1997
Pages
10848 - 10853
Database
ISI
SICI code
0163-1829(1997)55:16<10848:HAOTS->2.0.ZU;2-Z
Abstract
Through a series of ab initio calculations, we not only predict the at omic and electronic structure of CI on Ta(110), but also provide a qua ntitative basis for understanding a number of controversial questions regarding halogen adsorption on transition-metal surfaces. We demonstr ate that a simple dipole layer model accurately describes the unexpect ed decrease in the work function upon halogen absorption, and that our proposed overlayer structure explains the one-dimensional streaking i n the low-energy electron-diffraction pattern of the adsorbate-covered surface. An analysis of the electronic structure suggests that transi tion metals such as Ta look like simple metals from the point of view of highly electronegative adsorbates such as Cl.