EFFECTS OF LATTICE STEPS IN SURFACE-DIFFUSION AND EPITAXIAL-GROWTH

Citation
Tt. Tsong et al., EFFECTS OF LATTICE STEPS IN SURFACE-DIFFUSION AND EPITAXIAL-GROWTH, Applied surface science, 114, 1997, pp. 18-22
Citations number
17
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
114
Year of publication
1997
Pages
18 - 22
Database
ISI
SICI code
0169-4332(1997)114:<18:EOLSIS>2.0.ZU;2-R
Abstract
The lattice step is an integral part of a surface. We report a study o f the behavior of atoms al and near lattice steps since this behavior plays an important role in epilaxial growth and in affecting the struc ture of the thin films, particularly grown from the vapor phase, and a lso the dynamic behavior of the surface at elevated temperature. We us e Ir surfaces as our model system, and study self-diffusion on the ter race as well as along the step edges of the (001) and (111) surfaces u sing the field ion microscope. We also study the descending and ascend ing motion of diffusion atoms at lattice steps and the upward movement of in-layer atoms to the upper terrace.