ATOMIC-LEVEL ENGINEERING OF CUPRATES AND MANGANITES

Citation
I. Bozovic et Jn. Eckstein, ATOMIC-LEVEL ENGINEERING OF CUPRATES AND MANGANITES, Applied surface science, 114, 1997, pp. 189-197
Citations number
17
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
114
Year of publication
1997
Pages
189 - 197
Database
ISI
SICI code
0169-4332(1997)114:<189:AEOCAM>2.0.ZU;2-1
Abstract
Using ALL-MBE, we have engineered a novel, artificial (metastable) cup rate superconductor, BiSr2Ca7-xDyxCu8O19+y, in which only the central Ca layer is doped by Dy. This provides, within a single unit cell, the bottom superconducting electrode, an insulating barrier layer (only f ew A thick), and the top superconducting electrode, thus constituting an artificial intra-cell Josephson junction. In this way, we have fabr icated the first high-T-C tunnel (SIS) junctions. They exhibit signifi cant Josephson supercurrents and very sharp quasiparticle tunneling I- V characteristics. Next, single-crystal thin films of manganites grown by ALL-MBE have shown remarkable anisotropy of colossal magnetoresist ance (CMR). We have also fabricated lateral superlattices with alterna ting stripes (nano-wires) of La1-xCaxMnO3 and La1-xSrxMnO3, few tens o f nanometers wide. They show substantial in-plane anisotropy in transp ort properties, and a fivefold increase in low-field sensitivity. Our most recent results include successful growth of La1-xSrxMnO3 on top o f Bi2Sr2CaCu2O8, and vice versa.