INFLUENCE OF FILM THICKNESS ON THE MOLECULAR ARRANGEMENT OF COPPER PHTHALOCYANINE ON HYDROGEN-TERMINATED SI(111)

Citation
M. Nakamura et al., INFLUENCE OF FILM THICKNESS ON THE MOLECULAR ARRANGEMENT OF COPPER PHTHALOCYANINE ON HYDROGEN-TERMINATED SI(111), Applied surface science, 114, 1997, pp. 316-321
Citations number
10
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
114
Year of publication
1997
Pages
316 - 321
Database
ISI
SICI code
0169-4332(1997)114:<316:IOFTOT>2.0.ZU;2-J
Abstract
The growth nature of copper phthalocyanine thin-film from a monolayer to 20 nm thickness on hydrogen-terminated flat Si(111) was studied wit h MBE-STM and other complementary techniques. The molecules were found to absorb randomly at 60 degrees C for surface coverages up to around one monolayer, but, form an ordered structure above a few monolayers. At higher temperature (greater than or equal to 140 degrees C), cryst alline nuclei were observed from the very beginning of the growth and the remaining area was not fully covered by the molecules. These resul ts suggest that the stacking of the molecules of more than a few monol ayers is necessary to form an ordered two-dimensional lattice on this surface.