Hl. Hwang et al., MICROSTRUCTURE EVOLUTION OF HYDROGENATED SILICON THIN-FILMS AT DIFFERENT HYDROGEN INCORPORATION, Applied surface science, 114, 1997, pp. 741-749
Citations number
9
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
This paper describes the microstructure evolution of hydrogenated sili
con films containing various amounts of hydrogen, Microcrystalline sil
icon films were produced when the hydrogen content of the films was ad
justed by using the diluted-hydrogen methods. Polycrystalline silicon
films having grain sizes in the micrometer range were deposited at low
temperature (250 degrees C) by ECR-CVD with the hydrogen-dilution met
hod. The microcrystalline and polycrystalline films were characterized
by NMR, FTIR, Raman, X-ray and optical spectroscopy and electrical me
asurements, The results evaluate the possibility of even larger grain
silicon films suitable for high performance solar cells which avoid th
e fundamental difficulties of amorphous Si:H solar cells.