M. Stutzmann et al., ELECTRICAL AND STRUCTURAL-PROPERTIES OF ALGAN - A COMPARISON WITH CVDDIAMOND, DIAMOND AND RELATED MATERIALS, 7(2-5), 1998, pp. 123-128
The present state of the AlGaN system is discussed in comparison to th
e known properties of CVD diamond. Growth and structural features of t
hin films as well as heterostructures are described. The variation of
the fundamental optical gap with aluminum content provides the basis f
or the application of AlGaN in optical devices for the ultraviolet spe
ctral range. The large conduction band offset between GaN and AlN toge
ther with reasonable dopability of AlGaN allow the construction of new
field effect transistors with promising performance. The use of AlGaN
in surface acoustic wave devices and the potentially negative electro
n affinity of alloys with high Al content are also briefly mentioned.
(C) 1998 Elsevier Science S.A.