FLAT-FLAME DIAMOND CVD - THE EFFECT OF PRESSURE AND OPERATING-CONDITIONS FOR SPECIFIC APPLICATIONS

The radial uniformity and scaleable nature of flat flames make them an attractive technique for diamond deposition. The advantages of low-pr essure operation relative to atmospheric operation are discussed with respect to reactor design, heat transfer considerations and flame stab ility. The thermochemistry and kinetics of flat flames are described i n regard to process optimization. Examples are provided to describe ho w to tailor the low-pressure process for the following applications: m orphology control for the production of [100] textured films, low-temp erature deposition and the introduction of dopants. (C) 1998 Published by Elsevier Science S.A.