New packaging technologies, developed to support the increasing functi
onality and performance of today's and Mure IC generations, increasing
ly use photolithography for the fabrication of high-density interconne
ct layers and tape automated bonding (TAB) or solder bumps. Screen pri
nting and physical vapor deposition into a metal mask are running into
resolution and reliability limits where the highest performance is ne
eded. We have found that photolithography by proximity printing with a
mask aligner meets the technological and economic demands of the indu
stry.