MASK ALIGNERS IN ADVANCED PACKAGING

Citation
D. Tonnies et al., MASK ALIGNERS IN ADVANCED PACKAGING, Solid state technology, 41(3), 1998, pp. 13
Citations number
NO
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied","Physics, Condensed Matter
Journal title
ISSN journal
0038111X
Volume
41
Issue
3
Year of publication
1998
Database
ISI
SICI code
0038-111X(1998)41:3<13:MAIAP>2.0.ZU;2-R
Abstract
New packaging technologies, developed to support the increasing functi onality and performance of today's and Mure IC generations, increasing ly use photolithography for the fabrication of high-density interconne ct layers and tape automated bonding (TAB) or solder bumps. Screen pri nting and physical vapor deposition into a metal mask are running into resolution and reliability limits where the highest performance is ne eded. We have found that photolithography by proximity printing with a mask aligner meets the technological and economic demands of the indu stry.