A technique for the visualization of film coverage is described. The t
echnique can be applied in instances where surface regions wetted by a
flow need to be identified, but cannot be visualized in real time due
to geometric considerations (difficult to reach or observe surfaces).
The method introduces chemicals into a water how in addition to other
chemicals on the surfaces on which the water film coverage is to be v
isualized. The chemicals react wherever the how is incident on the sur
faces, leaving an identifiable pattern. The technique is applied in th
e study of silicon wafer rinsing, which is extensively used in microel
ectronics manufacturing.