SIGE POWER HBTS FOR LOW-VOLTAGE, HIGH-PERFORMANCE RF APPLICATIONS

Citation
Jn. Burghartz et al., SIGE POWER HBTS FOR LOW-VOLTAGE, HIGH-PERFORMANCE RF APPLICATIONS, IEEE electron device letters, 19(4), 1998, pp. 103-105
Citations number
6
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
07413106
Volume
19
Issue
4
Year of publication
1998
Pages
103 - 105
Database
ISI
SICI code
0741-3106(1998)19:4<103:SPHFLH>2.0.ZU;2-#
Abstract
Silicon-Germanium (SiGe) power heterojunction bipolar transistors (I-I BT's) are fabricated by using two or ten device unit cells with an emi tter area of 5 x 0.5 x 16.5 mu mw(2) each. The large power transistor features 1 W rf output power at 3-dB gain compression, 3.5 V bias, and 2.4 GHz with a maximum power-added-efficiency (PAE) of 48% for Class A/B operation. At a supply voltage of 1.5 V, the transistor delivers a 3-dB rf output power of 150 mW with a PAE of 47%. It is shown that a high collector doping level is advantageous for low-voltage operation, Further, by using special bias sense ports, the interconnect losses a re found to degrade the device performance to a considerable degree.