Interfacial phenomena in the SiCp/Al composite were investigated using
SEM, DSC, AES, and XRD. The value of these combined techniques in elu
cidating detailed interfacial phenomena was demonstrated. Theoretical
calculations of equilibrium Si contents required to prevent the format
ion of Al4C3 in the SiC/Al composite were performed by taking the vari
ations in Al and Si activities as well as those of other compounds int
o account for the calculations. Based on calculations, there exists a
transition temperature at which a sudden increase in equilibrium Si co
ntents required to prevent Al4C3 formation occurs. Experimental measur
ements of equilibrium Si contents were also performed to confirm the t
heoretical results. (C) 1998 Acta Metallurgica Inc.