STRUCTURAL AND ELECTRICAL-PROPERTIES OF DC SPUTTERED MOLYBDENUM FILMS

A method is described for the fabrication of low-resistivity molybdenu m films on soda-lime glass substrates. Films have been deposited using a DC magnetron sputtering system with a S-gun configuration, and have been characterized through X-ray diffraction, electrical conductivity , and Hall mobility measurements. The influence of the deposition para meters on both the resistivity of the Mo and on the contact resistivit y of the Mo/CuInSe2/Mo structure has been studied. Values of resistivi ty ranging from 1.2 x 10(-5) to 36 x 10(-5) Omega cm and of contact re sistivity ranging from 0.025 to 0.15 Omega cm(2) were found. (C) 1988 Elsevier Science B.V. All rights reserved.