PATTERN-FORMATION IN DRYING WATER FILMS

Citation
N. Samidmerzel et al., PATTERN-FORMATION IN DRYING WATER FILMS, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics, 57(3), 1998, pp. 2906-2913
Citations number
27
Categorie Soggetti
Physycs, Mathematical","Phsycs, Fluid & Plasmas
ISSN journal
1063651X
Volume
57
Issue
3
Year of publication
1998
Part
A
Pages
2906 - 2913
Database
ISI
SICI code
1063-651X(1998)57:3<2906:PIDWF>2.0.ZU;2-G
Abstract
A film of a volatile medium in contact with unsaturated vapor is bound to a plane substrate by both van der Waals and polar forces. We prese nt a thermodynamic description of this system, including exchange of m aterial between the fluid and the vapor under nonequilibrium condition s. For a range of values of the vapor pressure, a two-phase system dev elops, involving the coexistence of molecularly thin and macroscopical ly thick layers whose dynamics are controlled by the vapor pressure. T he theory is used to explain the origin of experimentally observed spa tial patterns in water films evaporating from clean mica substrates, w here scale and other features are a function of the vapor pressure. An analogy is developed between the initial stages of the pattern format ion and the diffusion-controlled solidification problem in two dimensi ons and typical features such as ''doublons'' or parity-broken dendrit es are observed. At later stages in the pattern formation hydrodynamic s becomes important.