O. Kraft et Wd. Nix, MEASUREMENT OF THE LATTICE THERMAL-EXPANSION COEFFICIENTS OF THIN METAL-FILMS ON SUBSTRATES, Journal of applied physics, 83(6), 1998, pp. 3035-3038
A difference in thermal expansion between a thin film and its substrat
e causes mechanical stresses in the film. Therefore, knowledge of the
thermal expansion coefficients of thin films are important for their t
echnological applications. In this article, we present an analysis whi
ch can be used to extract the thermal expansion coefficient of a thin
film material using a commonly used x-ray technique. The major advanta
ge of our approach is that it is not necessary to remove the film from
the substrate. The knowledge of the elastic constants of the thin fil
m material and their temperature dependence is not required, which is
particularly useful when thin film alloys are studied whose thermal an
d elastic properties are not available. For verification of the method
, we investigated thin Al films because the thermal and elastic proper
ties of bulk Al are well known. The comparison of our results with the
bulk properties shows a reasonable agreement, indicating the validity
of the new method. (C) 1998 American Institute of Physics.