Jf. Pierson et al., DIAGNOSTIC OF AR-BCL3 MICROWAVE DISCHARGES BY OPTICAL-EMISSION SPECTROSCOPY, Surface & coatings technology, 97(1-3), 1997, pp. 749-754
In this report, Ar-BCl3 plasmas produced by a 2450 MHz microwave disch
arge at 700 Pa are investigated by means of optical emission spectrosc
opy (OES). The emission spectrum of such discharges with high dilution
of BCl3 in argon is very rich in atomic lines (Ar, Cl, B+, Si) and mo
lecular bands (BCl, B-2, BO). The recently identified (1) (1) Delta(u)
--> b (1) Delta(g) and (2) (3) Pi(g)-->A (2) Pi(u) systems of B, are
observed and two new transitions are attributed to this latter system.
Weak BO bands corresponding to the A(2) Pi-->X-2 Sigma(+) transition
are also observed. The excitation channels leading to the formation of
these species are analysed by using data obtained by OES. Electron at
tachment reactions involving BCl3 are found to be important in the kin
etics of the microwave discharge, whereas reactions arising from metas
table argon energy transfer must be negligible. Spatial analysis of th
e microwave discharge by OES is also presented and processes leading t
o excited B-2 states are discussed. Etching reactions are important th
rough the observation of both Si and BO excited states at the end of t
he discharge. (C) 1997 Elsevier Science S.A.