INDUCTIVELY-COUPLED REACTIVE HIGH-DENSITY PLASMAS DESIGNED FOR SPUTTER-DEPOSITION

Two types of inductively coupled RF high-density plasmas designed for sputter deposition in an external magnetic field are studied experimen tally. One is helicon wave excited plasma in a magnetic field for cyli ndrical target sputtering. The other is planar magnetron discharge ass isted by an inductively coupled plasma. The plasmas are produced using helical antennas with azimuthal mode number of m=0. Plasma characteri stics are studied in Ar and reactive gases such as N-2, H-2 and/or O-2 . An RF wave field is measured and the excitation of helicon waves in a magnetic field is clarified in the production of high-density plasma s. Spectroscopic measurement of plasma emissions in the planar magnetr on discharges indicates remarkable increase of ionization of sputtered particles when it is assisted by an inductively coupled plasma. (C) 1 997 Elsevier Science S.A.