R. Westergard et al., MECHANICAL AND TRIBOLOGICAL CHARACTERIZATION OF DC MAGNETRON-SPUTTERED TANTALUM NITRIDE THIN-FILMS, Surface & coatings technology, 97(1-3), 1997, pp. 779-784
Tantalum nitride (TaxN1-x) coatings were deposited onto high-speed ste
el using reactive DC magnetron sputtering. Five different combinations
of magnetron power and nitrogen flow were used. Phase analysis (XRD)
revealed that the phase composition changes with increasing N-2 flow f
rom a mixture of Ta and Ta2N to single phase Ta2N. This result was sup
ported by GDOES analysis of the chemical composition. The coating hard
ness and residual stress were both found to increase with the amount o
f Ta2N in the coatings. In scratch testing, it was not possible to pro
voke adhesive failures at loads up to 100 N. Finally, the coating abra
sion resistance was very high for all specimens and found to increase
with the amount of Ta,N in the coatings. (C) 1997 Elsevier Science S.A
.