A new method of electric power input for plasma-processing batch scale
applications is presented. The concept is based on electric power spl
itting and rf-transformation within the vacuum chamber. The hardware f
or power transformation in a low-pressure environment is realized by m
odular rf-plasma sources operating with a heat storage system. Parasit
ic glow discharges and arcs can be avoided using the suggested method.
(C) 1998 Elsevier Science S.A.