(Ti, Al)N and (Ti, Al, Si)N coatings were annealed in air at temperatu
res ranging from 500 to 900 degrees C. The Ti.35Al.65N and Ti.62Al.38N
form a protective superficial layer of Al2O3, protecting the underlyi
ng nitride from further oxidation. Despite its higher aluminium conten
t, the Ti.19Al.81N and the Ti.27Al.73N develop a homogeneous oxide lay
er for all the oxidation temperatures, exhibiting the lowest oxidation
resistance, very similar to that of AlN. The Ti.70Si.30N forms a homo
geneous oxide layer, with an oxidation resistance similar to that of T
i.62Al.38N. The Ti.62Al.26Si.12 forms a two-phase scale as in the Ti.6
2Al.38N, but the oxidation resistance is slightly lower. The Ti.27Al.5
3Si.20N shows, for temperatures below 800 degrees C, the formation of
a homogeneous oxide layer, while for temperatures between 800 and 900
degrees C, an Al enrichment at the top layer is observed, which is res
ponsible for a better oxidation resistance at 850 degrees C than that
at 750 degrees C. (C) 1998 Elsevier Science S.A.