IN SITU-FORCE MEASUREMENT FOR THE DETERMINATION OF THE EVAPORATION RATE WITH HIGH-RATE ELECTRON-BEAM EVAPORATION

Citation
B. Scheffel et K. Goedicke, IN SITU-FORCE MEASUREMENT FOR THE DETERMINATION OF THE EVAPORATION RATE WITH HIGH-RATE ELECTRON-BEAM EVAPORATION, Surface & coatings technology, 98(1-3), 1998, pp. 944-947
Citations number
4
Categorie Soggetti
Materials Science, Coatings & Films
ISSN journal
02578972
Volume
98
Issue
1-3
Year of publication
1998
Pages
944 - 947
Database
ISI
SICI code
0257-8972(1998)98:1-3<944:ISMFTD>2.0.ZU;2-P
Abstract
A technique for the measurement of force at a water-cooled crucible du ring high rate electron beam evaporation is described. This technique has been used for the in situ measurement of the evaporation rate of t itanium. With an electron beam power in the range of 30-150 kW an evap oration rate of 0.3-2.5 g s(-1) was measured with this method. The for ce on the molten titanium surface caused by recoil and vapor pressure was measured to be 0.2-1.5 N. An additional force has been measured in the case of a spotless cathodic are burning in the titanium vapor to achieve a high-rate plasma activated deposition. (C) 1998 Elsevier Sci ence S.A.