B. Scheffel et K. Goedicke, IN SITU-FORCE MEASUREMENT FOR THE DETERMINATION OF THE EVAPORATION RATE WITH HIGH-RATE ELECTRON-BEAM EVAPORATION, Surface & coatings technology, 98(1-3), 1998, pp. 944-947
A technique for the measurement of force at a water-cooled crucible du
ring high rate electron beam evaporation is described. This technique
has been used for the in situ measurement of the evaporation rate of t
itanium. With an electron beam power in the range of 30-150 kW an evap
oration rate of 0.3-2.5 g s(-1) was measured with this method. The for
ce on the molten titanium surface caused by recoil and vapor pressure
was measured to be 0.2-1.5 N. An additional force has been measured in
the case of a spotless cathodic are burning in the titanium vapor to
achieve a high-rate plasma activated deposition. (C) 1998 Elsevier Sci
ence S.A.