CHARACTERIZATION OF LOW-FREQUENCY PLASMA GENERATED IN A 3-ELECTRODE REACTOR

Citation
J. Tyczkowski et al., CHARACTERIZATION OF LOW-FREQUENCY PLASMA GENERATED IN A 3-ELECTRODE REACTOR, Surface & coatings technology, 98(1-3), 1998, pp. 1365-1369
Citations number
13
Categorie Soggetti
Materials Science, Coatings & Films
ISSN journal
02578972
Volume
98
Issue
1-3
Year of publication
1998
Pages
1365 - 1369
Database
ISI
SICI code
0257-8972(1998)98:1-3<1365:COLPGI>2.0.ZU;2-S
Abstract
Electrical characteristic of argon plasma generated in a novel, three- electrode audio frequency (AF) reactor has been investigated by means of a Langmuir single probe movable in the space between reactor electr odes. Both AF potentials of plasma in various places of the reactor an d typical current-voltage characteristics have been measured. It has b een found that energetic conditions of the plasma, such as electron de nsity and electron temperature, are independent on the coupling capaci ty C - the only operational parameter used in the reactor. Changes of C have, however, influence on the ion bombardment process taking place in the vicinity of a small electrode. The ion bombardment energy has been roughly estimated. The calculated values are in a good agreement with results of an experiment performed in the reactor with argon sput ter etching of a gold him. (C) 1998 Elsevier Science S.A.