J. Tyczkowski et al., CHARACTERIZATION OF LOW-FREQUENCY PLASMA GENERATED IN A 3-ELECTRODE REACTOR, Surface & coatings technology, 98(1-3), 1998, pp. 1365-1369
Electrical characteristic of argon plasma generated in a novel, three-
electrode audio frequency (AF) reactor has been investigated by means
of a Langmuir single probe movable in the space between reactor electr
odes. Both AF potentials of plasma in various places of the reactor an
d typical current-voltage characteristics have been measured. It has b
een found that energetic conditions of the plasma, such as electron de
nsity and electron temperature, are independent on the coupling capaci
ty C - the only operational parameter used in the reactor. Changes of
C have, however, influence on the ion bombardment process taking place
in the vicinity of a small electrode. The ion bombardment energy has
been roughly estimated. The calculated values are in a good agreement
with results of an experiment performed in the reactor with argon sput
ter etching of a gold him. (C) 1998 Elsevier Science S.A.