DIAGNOSTIC OF ARC DISCHARGES FOR PLASMA NITRIDING BY OPTICAL-EMISSIONSPECTROSCOPY

Citation
N. Renevier et al., DIAGNOSTIC OF ARC DISCHARGES FOR PLASMA NITRIDING BY OPTICAL-EMISSIONSPECTROSCOPY, Surface & coatings technology, 98(1-3), 1998, pp. 1400-1405
Citations number
25
Categorie Soggetti
Materials Science, Coatings & Films
ISSN journal
02578972
Volume
98
Issue
1-3
Year of publication
1998
Pages
1400 - 1405
Database
ISI
SICI code
0257-8972(1998)98:1-3<1400:DOADFP>2.0.ZU;2-2
Abstract
A new high current (100-300 A), low voltage (25-45 V) and low pressure (0.4-1 Pa) are discharge plasma used for steel nitriding is presented and characterized by optical emission spectroscopy (OES), In this pro cess, the nitriding rate is high even if the workpieces are nitrided a t floating potential without hydrogen in Ar-N-2 gas mixtures. With H-2 , there is no appreciable gain in nitrogen content or in growth rate o f the diffusion layer. In this paper, the OES diagnostic technique has been used to characterize the different excitation processes of both neutral and ionic argon species in Ar-N-2, Ar-H-2 and Ar-N-2-H-2 gas m ixtures. The reactivity of this process is evaluated by using AISI 316 L austenitic stainless steel substrates nitrided for different treatm ent times at 690 K. (C) 1998 Elsevier Science S.A.