CVD-PROCESSES BY HOLLOW-CATHODE GLOW-DISCHARGE

Hollow cathode glow discharges are able to generate stable plasmas of high density under a rough vacuum environment, can be easily driven by d.c. excitation and require no complicated source design. The applica tion of this discharge type for plasma chemical applications is studie d in the case of plasma-enhanced chemical vapour deposition of hydroge nated amorphous carbon films without and with a metal content (a-C:H a nd Ti-C:H). The precursor gases were ethine and methane. A linear corr elation between deposition rate and input power was observed. Film dep osition rates up to 12 mu m/h in the maximum with a half width across the source elongation of approximately 6 cm were obtained. The basic c oating properties of wear resistance and hardness are comparable with established RF methods. The potential of two-dimensional upscaling was successfully demonstrated with an array of five parallel linear sourc es. (C) 1998 Elsevier Science S.A.