ELECTRONIC STRUCTURE OF IRIDIUM OXIDE-FILMS FORMED IN NEUTRAL PHOSPHATE BUFFER SOLUTION

Citation
Tm. Silva et al., ELECTRONIC STRUCTURE OF IRIDIUM OXIDE-FILMS FORMED IN NEUTRAL PHOSPHATE BUFFER SOLUTION, Journal of electroanalytical chemistry [1992], 441(1-2), 1998, pp. 5-12
Citations number
43
Categorie Soggetti
Electrochemistry,"Chemistry Analytical
Journal title
Journal of electroanalytical chemistry [1992]
ISSN journal
15726657 → ACNP
Volume
441
Issue
1-2
Year of publication
1998
Pages
5 - 12
Database
ISI
SICI code
Abstract
Iridium oxide films were formed by potential cycling in neutral phosph ate buffer solution (pH = 6.9) and studied by capacitance and photoele ctrochemical measurements, and by TEM. The results have revealed p-typ e semiconductivity of the oxide. The increase of the electric conducti vity occurring simultaneously with the colouring of the film is explai ned by a transition, at the film\electrolyte interface, from a Schottk y barrier to an ohmic contact. This transition takes place at the flat band potential; which is close to the potential of the main voltammetr ic peak. The doping values obtained from the Mott-Schottky approach ar e related with the porous structure of the film. (C) 1998 Elsevier Sci ence S.A.