A NEW MODEL OF DLA UNDER HIGH MAGNETIC-FIELD

A new Monte Carlo model is introduced to describe diffusion-limited ag gregation (DLA) with extra forces arising from Lorentz's and/or Coulom b forces. Furthermore, we simulate a behavior of multiparticle diffusi ve aggregation to examine the resultant pattern of crystal in electroc hemical deposition. Different patterns grown under various external fo rces are produced by Monte Carlo simulations. In the present model, th e basic movement of particles is a random walk, with different transit ion probabilities in different directions, which characterizes stochas tically the effect of extra forces. In case of assuming a high magneti c field, pattern formations which an qualitatively different from the standard DLA model are observed and they are successfully compared wit h preexisting experiments (Mogi et al., 1991). The present numerical r esults of electrochemical deposition show that the generated patterns strongly depend on the force acting on ions and their concentration (S awada et al., 1986). Copyright (C) 1998 Elsevier Science B.V.