CONTROL OF PRODUCING SUMICRON X-RAY MASKS

Authors
GREENFIELD DE KORSAKOV VS MISHACHOV VI TRUTNEV NF
Citation
De. Greenfield et al., CONTROL OF PRODUCING SUMICRON X-RAY MASKS, Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 405(2-3), 1998, pp. 514-518
Citations number
3
Categorie Soggetti
Nuclear Sciences & Tecnology","Physics, Particles & Fields","Instument & Instrumentation",Spectroscopy
Journal title
Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment → ACNP
ISSN journal
01689002
Volume
405
Issue
2-3
Year of publication
1998
Pages
514 - 518
Database
ISI
SICI code
0168-9002(1998)405:2-3<514:COPSXM>2.0.ZU;2-X
Abstract
A depth control method in etching metal films for X-ray lithography ma sks is developed and experimentally confirmed. Possibilities of real-t ime end-point detection and applicability of this technique for automa tic process control are demonstrated.