J. Sonsky et al., THE EXPERIENCE WITH PULSED-LASER DEPOSITION OF ND-YAG AND ND-YAP THIN-FILMS FOR PLANAR LASER WAVE-GUIDES, Laser physics, 8(1), 1998, pp. 285-290
The thin films of YAG (Y3Al5O12) and YAP (YAlO3) doped with Nd were pr
epared by pulsed laser deposition on sapphire substrates of (0001) and
(<1(1)over bar>02) orientations, and YAP substrate oriented as (001).
The influence of the deposition parameters, i.e., the substrate tempe
rature (T-s) and ambient O-2 pressure (p(0)), on film properties inclu
ding the structure, the morphology, the Al/Y ratio, the degree of inco
rporated Nd, and the refractive index was studied. The substrate tempe
rature varied from 860 degrees C to 1090 degrees C and the O-2 pressur
e changed in the range from 8.5 x 10(-3) Pa (vacuum) to 5.5 Pa. The ex
periments of amorphous films crystallization by thermal annealing in f
lowing Ar were carried out, and the change of structure and luminescen
ce spectra are discussed. The film properties were characterized by XR
D, SEM, electron microprobe, luminescence measurements, and mode spect
roscopy.