Nx. Randall et al., CHARACTERIZATION OF INTEGRATED-CIRCUIT ALUMINUM BONDING PADS BY NANOINDENTATION AND SCANNING FORCE MICROSCOPY, Surface & coatings technology, 99(1-2), 1998, pp. 111-117
The mechanical properties of thin films and surface modified layers ca
n be measured by a variety of different techniques, with nanoindentati
on being one of the most recent developments in this growing field. It
is particularly suited to the characterization of bonding pads used t
o connect individual microcircuits and chips. Such pads are commonly m
ade of aluminium and have a thickness of approximately 1 mu m. By usin
g a depth-sensing indentation method it is possible to obtain quantita
tive values for the hardness and modulus, and thus gain better insight
into the response of a bonding pad material to controlled deformation
at such small scales. The nano hardness tester (NHT) is a recently de
veloped instrument using an already established method where an indent
er tip with a known geometry is driven into a specific site of the mat
erial to be tested, by applying an increasing normal load. When reachi
ng a preset maximum value, the normal load is reduced until partial or
complete relaxation occurs. At each stage of the experiment the posit
ion of the indenter relative to the sample surface is precisely monito
red with a differential capacitive sensor, giving a load/displacement
curve characteristic of the sample material. By consequently measuring
the topography of the residual indent using a surface imaging techniq
ue (e.g., scanning force microscopy) and combining this information wi
th the indentation data, it is possible to gain a fuller understanding
of the material response, as well as additional information on surfac
e roughness and frictional properties, the latter being of particular
importance in bonding applications. Experimental results are presented
for a variety of integrated circuit bonding pads, these confirming th
e ability of the NHT to becoming a common test in quality assurance an
d process development of thin films and coatings for the microelectron
ics industry. (C) 1998 Elsevier Science S.A.