MGO BY INJECTION CVD

Citation
A. Abrutis et al., MGO BY INJECTION CVD, Thin solid films, 311(1-2), 1997, pp. 251-258
Citations number
19
Journal title
ISSN journal
00406090
Volume
311
Issue
1-2
Year of publication
1997
Pages
251 - 258
Database
ISI
SICI code
0040-6090(1997)311:1-2<251:>2.0.ZU;2-6
Abstract
Epitaxial YBa2Cu3O7 layers with 45 degrees in-plane orientation have b een grown by Injection CVD on MgO substrates polished off-axis to with in 1.4-1.9 degrees of the [100] direction. This new single-source CVD process is based on computer-controlled injection of precise microdose s of a metal-organic precursor solution into a CVD reactor. A wide ran ge of solution compositions was tested to investigate compositional ef fects on phase purity, surface morphology, texturing and superconducti ng properties of the prepared films. The highest quality films with pu re 45 degrees texture had a smooth surface, zero resistance T-c (R = 0 ) of 88-89 K, and critical current density J(c) (77 K) above 10(6) A/c m(2). (C) 1997 Elsevier Science S.A.