The room-temperature growth of gold on Si(111) surfaces has been direc
tly compared for nonreconstructed hydro en-terminated surfaces and the
bare 7x7-reconstructed surface by means of high-resolution core-level
and valence-band photoelectron spectroscopy and Auger spectroscopy. T
he growth modes show strong differences with gold island formation on
the passivated H:Si(111)-(1x1) surface. Silicon segregated on top of t
he deposited gold film is seen for both interfaces. The Schottky barri
er is only weakly affected by the hydrogen termination.