CHARGE INJECTION INTO POROUS SILICON ELECTROLUMINESCENT DEVICES

Citation
G. Wakefield et al., CHARGE INJECTION INTO POROUS SILICON ELECTROLUMINESCENT DEVICES, Materials science & engineering. B, Solid-state materials for advanced technology, 51(1-3), 1998, pp. 141-145
Citations number
18
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
09215107
Volume
51
Issue
1-3
Year of publication
1998
Pages
141 - 145
Database
ISI
SICI code
0921-5107(1998)51:1-3<141:CIIPSE>2.0.ZU;2-M
Abstract
Light emitting porous silicon has been studied in a high resolution tr ansmission electron microscope. These studies show that the microstruc ture is highly dependent on the doping level of the silicon substrate, and on the formation conditions. We have shown that the most efficien t light emitting structures are quantum dot like, and that the microst ructure consists of silicon dots of size 3-4 nm surrounded by a thin o xide layer. Based on this we have developed a new type of contact in o rder to inject holes into an electroluminescent device based on an n-t ype porous silicon layer. Poly(9-vinyl carbazole) is spin coated on a fresh porous silicon layer, and then either indium tin oxide or NiO is used to inject holes. The polymer layer increases the luminescence ou tput by two orders of magnitude, while the use of NiO as a replacement for ITO reduces the switch-on voltage from 55-60 to 10-15 V. These re sults allow us to propose an energy band model of the device, which is discussed in terms of both the quantum wire and quantum dot models of porous silicon. (C) 1998 Elsevier Science S.A. All rights.