STRAINED-LAYER INGAAS-GAAS-INGAP BURIED-HETEROSTRUCTURE QUANTUM-WELL LASERS ON A LOW-COMPOSITION INGAAS SUBSTRATE BY SELECTIVE-AREA MOCVD

Citation
Am. Jones et al., STRAINED-LAYER INGAAS-GAAS-INGAP BURIED-HETEROSTRUCTURE QUANTUM-WELL LASERS ON A LOW-COMPOSITION INGAAS SUBSTRATE BY SELECTIVE-AREA MOCVD, IEEE photonics technology letters, 10(4), 1998, pp. 489-491
Citations number
12
Categorie Soggetti
Optics,"Physics, Applied
ISSN journal
10411135
Volume
10
Issue
4
Year of publication
1998
Pages
489 - 491
Database
ISI
SICI code
1041-1135(1998)10:4<489:SIBQL>2.0.ZU;2-P
Abstract
Aluminum-free buried-heterostructure quantum-well lasers have been suc cessfully fabricated on low-composition InGaAs:n substrates. Selective -area metalorganic chemical vapor deposition (MOCVD) was utilized to i nvestigate a variety of InGaAs quantum wells with a wide range of comp osition and thickness. Compressively strained quantum wells can be dep osited thicker on substrates of InGaAs than GaAs before the generation of misfit dislocations. These deeper potential wells enable laser dio des with longer wavelengths (1.1504 mu m) than GaAs-based emitters and higher characteristic temperatures (145 K) than InP-based devices.