INFRARED SPECTROSCOPIC STUDY OF SIOX FILM FORMATION AND DECOMPOSITIONOF VINYL SILANE DERIVATIVE BY HEAT-TREATMENT - I - ON KBR AND GOLD SURFACE

Authors
Citation
H. Kim et J. Jang, INFRARED SPECTROSCOPIC STUDY OF SIOX FILM FORMATION AND DECOMPOSITIONOF VINYL SILANE DERIVATIVE BY HEAT-TREATMENT - I - ON KBR AND GOLD SURFACE, Journal of applied polymer science, 68(5), 1998, pp. 775-784
Citations number
29
Categorie Soggetti
Polymer Sciences
ISSN journal
00218995
Volume
68
Issue
5
Year of publication
1998
Pages
775 - 784
Database
ISI
SICI code
0021-8995(1998)68:5<775:ISSOSF>2.0.ZU;2-2
Abstract
The free-radical copolymerization of vinyltrimethoxysilane (VTS) with vinylimidazole (VI) was carried out in benzene at 68 degrees C. Thermo oxidative degradation and the SiOx film-formation mechanism of poly(VI -co-VTS) both on gold and KBr were studied with Fourier transform infr ared (FTIR) spectroscopy. Reflection-absorption (RA) spectra on gold w ere compared with transmission spectra on KBr. In the initial stage of heat treatment, the Si--O--Si bond formation was caused mainly by the residual water in the copolymer film. As heating time increased, howe ver, both the water resulting from the thermal decomposition of the co polymer and the water vapor in air began to participate in the hydroly sis of the Si--O--CH3 group followed by the condensation reaction. The structure of the SiOx film became closer to the structure of SiO2 wit h increasing heating temperature. In addition, the differences between the transmission spectra and R-A spectra were observed at the peaks r elated to Si--O--Si stretching due to the optical effect. (C) 1998 Joh n Wiley & Sons, Inc.