Gr. Bai et al., IN-SITU GROWTH OF HIGHLY ORIENTED PB(ZR0.5TI0.5)O-3 THIN-FILMS BY LOW-TEMPERATURE METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION, Applied physics letters, 72(13), 1998, pp. 1572-1574
Highly oriented, polycrystalline Pb(Zr0.5Ti0.5)O-3 (PZT) thin films we
re successfully grown on RuO2/SiO2/(001)Si using metal-organic chemica
l vapor deposition (MOCVD) at 525 degrees C. The orientation of the PZ
T film was controlled by using MOCVD-deposited highly textured RuO2 bo
ttom electrodes. A (001)-oriented PZT film was observed for growth on
(101)-textured RuO2. In contrast, for (110) RuO2, the growth of (001)
PZT was greatly suppressed while the growth of both (110) and (111) we
re enhanced, resulting in a poorly (001)-textured polycrystalline film
. The as-grown PZT films exhibited a dense columnar microstructure wit
h an average grain size of 150-750 nm. Both PZT films showed excellent
ferroelectric properties without any postgrowth annealing, The (001)
highly oriented PZT films showed significantly higher values of remnan
t polarization (P-r=49.7 mu C/cm(2)) and saturation polarization (P-s=
82.5 mu C/cm(2)). In comparison, for the PZT films grown on (110) RuO2
, P-r and P-s were 21.5 and 35.4 mu C/cm(2), respectively. (C) 1998 Am
erican Institute of Physics.