SELECTIVE GOLD DEPOSITION VIA CVD ONTO SELF-ASSEMBLED ORGANIC MONOLAYERS

We demonstrate a selective deposition of ultrathin gold layers via CVD onto self-assembled dithiols. Dithiols have been self-assembled to pr oduce a thiolated surface. Metallic gold was deposited from the gas ph ase by using a volatile organometallic molecular gold precursor. The g old layer is bound to the exposed thiol groups. We demonstrate a selec tive deposition of the gold only at the areas where the binding thiol groups are located and characterized the deposition process and the ob tained coatings with spontaneous desorption time of flight mass spectr ometry and Rutherford backscattering spectroscopy. (C) 1998 Elsevier S cience B.V.