SCATTERING OF ELECTRONS AT THREADING DISLOCATIONS IN GAN

Citation
Ng. Weimann et al., SCATTERING OF ELECTRONS AT THREADING DISLOCATIONS IN GAN, Journal of applied physics, 83(7), 1998, pp. 3656-3659
Citations number
15
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
83
Issue
7
Year of publication
1998
Pages
3656 - 3659
Database
ISI
SICI code
0021-8979(1998)83:7<3656:SOEATD>2.0.ZU;2-O
Abstract
A model to explain the observed low transverse mobility in GaN by scat tering of electrons at charged dislocation lines is proposed. Filled t raps along threading dislocation lines act as Coulomb scattering cente rs. The statistics of trap occupancy at different doping levels are in vestigated. The theoretical transverse mobility from Coulomb scatterin g at charged traps is compared to experimental data. Due to the repuls ive potential around the charged dislocation lines, electron transport parallel to the dislocations is unaffected by the scattering at charg ed dislocation lines. (C) 1998 American Institute of Physics. [S0021-8 979(98)02207-5].