DIFFUSION THERMOPOWER OF A SILICON INVERSION LAYER AT LOW MAGNETIC-FIELDS

Citation
R. Fletcher et al., DIFFUSION THERMOPOWER OF A SILICON INVERSION LAYER AT LOW MAGNETIC-FIELDS, Physical review. B, Condensed matter, 57(12), 1998, pp. 7174-7181
Citations number
26
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
01631829
Volume
57
Issue
12
Year of publication
1998
Pages
7174 - 7181
Database
ISI
SICI code
0163-1829(1998)57:12<7174:DTOASI>2.0.ZU;2-G
Abstract
We have investigated the longitudinal and transverse thermopowers, S-x x and S-yx, of an electron inversion layer in a Si-metal-oxide-semicon ductor field-effect transistor at low magnetic fields in the temperatu re range similar to 0.5-4 K. We show that a single theoretical model, based on the Mott relation for diffusion, gives a good account of both the quantum oscillations and the smooth background at low temperature s where phonon drag can be ignored. An anomalous nonoscillatory compon ent, possibly due to phonon drag, is found in S-yx at higher temperatu res.