Jm. Engels et al., CUXY COMPOUNDS AS THIN-FILMS - CRYSTALLOGRAPHIC AND COMPOSITIONAL ANALYSES OF YTTRIUM RICH PHASES, Journal of alloys and compounds, 267(1-2), 1998, pp. 283-293
The interdiffusion of Y films deposited onto Cu substrate by flash eva
poration and sputtering was studied (concentration profiles, X-ray and
electron diffraction patterns) in the temperature range 373-553 K. In
samples deposited by Bash evaporation the first phase to be detected
is CuY at 393 K. At higher temperatures an intermediate phase, close t
o the Cu3Y2 compound, is formed before the Cu2Y stoichiometric phase i
s produced at 513 K. Crystallographic data confirm the formation of th
is intermediate Cu3Y2 phase (orthorhombic unit-cell) as resulting from
the reaction CuY+Cu2Y-->Cu3Y2. The results are identical for sputtere
d Y films deposited under a cryogenic vacuum (2-5X10(-7) Pa). When Y i
s deposited under a standard vacuum (2-5X10(-6) Pa), the influence of
a diffusion barrier at the Cu-Y interface is noticed. This influence i
s characterized in the concentration profiles by an Y concentration hu
mp at the Cu-Y interface and a depletion of Y at the front of the prof
ile. Three main phases are observed. They correspond to the Cu5Y2, Cu2
Y and Cu3Y2 compounds. (C) 1998 Elsevier Science S.A.