INVESTIGATION OF THE OFFSET CHARGE NOISE IN SINGLE-ELECTRON TUNNELINGDEVICES

Citation
H. Wolf et al., INVESTIGATION OF THE OFFSET CHARGE NOISE IN SINGLE-ELECTRON TUNNELINGDEVICES, IEEE transactions on instrumentation and measurement, 46(2), 1997, pp. 303-306
Citations number
8
Categorie Soggetti
Engineering, Eletrical & Electronic","Instument & Instrumentation
ISSN journal
00189456
Volume
46
Issue
2
Year of publication
1997
Pages
303 - 306
Database
ISI
SICI code
0018-9456(1997)46:2<303:IOTOCN>2.0.ZU;2-2
Abstract
The offset charge noise in metallic single electron tunneling (SET) de vices fabricated on dielectric substrates was experimentally studied, On the basis of stereoscopic measurements of the low-frequency charge noise we show that the substrate makes an essential contribution to th e total noise, We have observed that the intensity of the charge noise in SET transistors depends on the biasing de current but is almost in sensitive to temperature variations up to 300 mK. Stability investigat ions of an SET trap gave storage times of more than 8 h, The performan ce of such a device is affected by the bias current of a readout elect rometer, located nearby, and by background charges.