STM AND PHOTOELECTRON-SPECTROSCOPY STUDIES OF SILICON CERIUM DIOXIDE INTERFACE FORMATION

Citation
Mg. Rad et al., STM AND PHOTOELECTRON-SPECTROSCOPY STUDIES OF SILICON CERIUM DIOXIDE INTERFACE FORMATION, Vacuum, 49(3), 1998, pp. 175-179
Citations number
17
Categorie Soggetti
Physics, Applied","Material Science
Journal title
VacuumACNP
ISSN journal
0042207X
Volume
49
Issue
3
Year of publication
1998
Pages
175 - 179
Database
ISI
SICI code
0042-207X(1998)49:3<175:SAPSOS>2.0.ZU;2-F
Abstract
Scanning tunnelling microscopy (STM) and photoelectron spectroscopy (P ES) have been used to investigate the initial growth of cerium dioxide on the Si(111) 7 x 7 surface at room temperature. The Si adatom struc ture is disrupted and chemically reacted by cerium oxide adsorption. B oth Si 2p core level spectra as well as the STM images show that the a datoms and piedestal atoms serve as the primary reaction site at low c overage. A multitude of adsorbate induced configurations are found by STM on the surface:atomic oxygen inserted into the adatom back bond, a tomic Ce in hollow sites and a variety of CeOx. (C) 1998 Elsevier Scie nce Ltd. All rights reserved.